vapor deposition

garinis nusodinimas statusas T sritis radioelektronika atitikmenys: angl. evaporation deposition; vapor deposition; vapor-phase deposition vok. Abscheidung aus der Dampfphase, f; Dampfphasenabscheidung, f rus. осаждение из паровой фазы, n pranc. déposition en phase vapeur, f

Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. . 2000.

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  • Vapor deposition — can refer to: * Chemical vapor deposition * Physical vapor deposition …   Wikipedia

  • vapor deposition —  Vapor Deposition  Осаждение из газовой фазы   Химическое осаждение из газовой фазы получение твердых веществ с помощью химических реакций, в которых участвуют газообразные реагенты. Используют для получения текстурированных покрытий,… …   Толковый англо-русский словарь по нанотехнологии. - М.

  • vapor deposition — A production of a surface film of metal on a heated surface, usually in a vacuum, either by decomposition of the vapor of a compound at the work surface, or by direct reaction between the work surface and the vapor. Also see zinc vapor deposition …   Dictionary of automotive terms

  • vapor deposition — užgarinimas statusas T sritis fizika atitikmenys: angl. evaporation; vapor deposition; vapour deposition vok. Aufdampfung, f; Bedampfung, f rus. нанесение испарением, n pranc. dépôt en phase vapeur, m …   Fizikos terminų žodynas

  • vapor deposition equipment — garinio nusodinimo įrenginys statusas T sritis radioelektronika atitikmenys: angl. vapor deposition equipment vok. Bedampfungsanlage, f rus. установка осаждения из паровой фазы, f pranc. équipement de déposition en phase vapeur, m …   Radioelektronikos terminų žodynas

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • Chemical vapor deposition of ruthenium — is a method to deposit thin layers of ruthenium on substrate by Chemical vapor deposition (CVD). A unique challenge arises in trying to grow impurity free films of a catalyst in Chemical vapor deposition (CVD). Ruthenium metal activates C H and C …   Wikipedia

  • Combustion chemical vapor deposition — (CCVD) is a chemical process by which thin film coatings are deposited onto substrates in the open atmosphere. Contents 1 History 2 Principles and procedure 3 Remote combustion chemical v …   Wikipedia

  • Hybrid Physical-Chemical Vapor Deposition — (HPCVD) is a thin film deposition technique that combines physical vapor deposition (PVD) with chemical vapor deposition (CVD). For the instance of magnesium diboride (MgB2) thin film growth, HPCVD process uses diborane (B2H6) as the boron… …   Wikipedia

  • Physical vapor deposition — (PVD) is a variety of vacuum deposition and is a general term used to describe any of a variety of methods to deposit thin films by the condensation of a vaporized form of the material onto various surfaces (e.g., onto semiconductor wafers). The… …   Wikipedia

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